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Sputtering Target

Germanium (Ge) Sputtering Target

Time:2020/07/13 丨 source:Fast Silver 丨 visit count:

Germanium (Ge) Sputtering Target

Germanium is a semiconductor and frequently utilized in the fabrication of transistors and integrated circuits. It is often evaporated under vacuum to create layers in the production of optical storage media and optical coatings

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Specifications
Material Type Germanium
Symbol Ge
Purity 99.999%
Size 1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit 1pc
Atomic Weight 72.63 Z Ratio 0.516
Color/Appearance Grayish White, Semi-Metallic Sputter DC (doped), RF
Thermal Conductivity 60 W/m.K Max Power Density(Watts/Square Inch) 20*
Melting Point (°C) 937 Type of Bond Indium, Elastomer
Coefficient of Thermal Expansion 6 x 10-6/K Max Power Density(Watts/Square Inch) 100*
Theoretical Density (g/cc) 5.32 Comments Excellent films from E-beam

 

 

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