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Sputtering Target

Indium Oxide (In2O3) Sputtering Target

Time:2020/07/13 丨 source:Fast Silver 丨 visit count:

Indium Oxide (In2O3) Sputtering Target

Indium Oxide can be used in various applications by obtaining a film.It is a prospective electrode which can be applied to flexible display devices and solar cells as well as the conventional devices needing transparent conducting oxide films. It can also be deposited on polyethersulfone (PES) and glass substrates for OLED applications.

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Specifications
Material Type Indium Oxide
Symbol In2O3
Purity 99.99%
Size 1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit 1pc
Theoretical Density (g/cc) 7.18
Melting Point (°C) 2000ºC Sputter RF, DC
Type of Bond Indium, Elastomer Max Power Density
(Watts/Square Inch)
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