Magnesium Fluoride (MgF2) Sputtering Target

Time：2020/07/13 丨 source：Fast Silver 丨 visit count：

Magnesium Fluoride (MgF2) Sputtering Target

Magnesium Fluoride are widely used in anti-reflection thin film coating.

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Specifications
Material Type	Magnesium Fluoride
Symbol	MgF2
Purity	99.99%
Size	φD76.2*6mm
Package Unit	1pc
Theoretical Density (g/cc)	3.15	Z Ratio	0.637
Color/Appearance	White, Crystalline Solid	Sputter	RF
Thermal Conductivity	--	Comments	Substrate temp and rate control important. Reacts with W. Mo OK
Melting Point (°C)	1,261	E-Beam Crucible Liner Material	Direct in Hearth
Temp. (°C) for Given Vap. Press. (Torr)	--:  --

 

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