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Sputtering Target

Magnesium Fluoride (MgF2) Sputtering Target

Time:2020/07/13 丨 source:Fast Silver 丨 visit count:

Magnesium Fluoride (MgF2) Sputtering Target

Magnesium Fluoride are widely used in anti-reflection thin film coating.

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Specifications
Material Type Magnesium Fluoride
Symbol MgF2
Purity 99.99%
Size φD76.2*6mm
Package Unit 1pc
Theoretical Density (g/cc) 3.15 Z Ratio 0.637
Color/Appearance White, Crystalline Solid Sputter RF
Thermal Conductivity -- Comments Substrate temp and rate control important. Reacts with W. Mo OK
Melting Point (°C) 1,261 E-Beam Crucible Liner Material Direct in Hearth
Temp. (°C) for Given Vap. Press. (Torr) --:  --     
 

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