Nickel Oxide Dopping Sputtering Target

Time：2020/10/19 丨 source：未知 丨 visit count：

Nickel Oxide Dopping (NiO/CuO; NiO/ZnO; NiO/Al2O3) Sputtering Target

NiO Dopping Sputtering Targets are used for thin film coating.

For questions about target material or anything we can hlep, please click here.

 

Specifications
Material Type	Nickle Oxide Dopping Target
Symbol	NiO/ CuO;NiO/ZnO; NiO/Al2O3
Purity	99.9%
Size	1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit	1pc
Theoretical Density (g/cc)	6.84
Melting Point (°C)	1960 °C	Sputter	RF, RF-R, DC
Type of Bond	Indium, Elastomer	Max Power Density (Watts/Square Inch)	--

 

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